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ISO 14237:2010

Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials

Standard Details

ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.

General Information

Status : Published
Standard Type: Main
Document No: ISO 14237:2010
Document Year: 2010
Pages: 19
Edition: 2

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ISO 14237:2010
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