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Status : Active
Standard Type : Main
Document No : ISO 17331:2004
Document Year : 2004
Pages : 18
Edition : 1
Section Volume : Surface chemical analysis (ISO/TC 201.)
ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method.
It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.