logo

Standards Manage Your Business

We Manage Your Standards

ISO

ISO 17331:2004

Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy

Standard Details

ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method.

It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.

General Information

Status : Published
Standard Type: Main
Document No: ISO 17331:2004
Document Year: 2004
Pages: 18
Edition: 1

Life Cycle

Currently Viewing

Published
ISO 17331:2004
Knowledge Corner

Expand Your Knowledge and Unlock Your Learning Potential - Your One-Stop Source for Information!

© Copyright 2024 BSB Edge Private Limited.

Enquire now +