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ISO 21466:2019

ISO 21466:2019

Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM

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General Information

Status : Active

Standard Type : Main

Document No : ISO 21466:2019

Document Year : 2019

Pages : 47

Edition : 1

Section Volume : Scanning electron microscopy (SEM) (ISO/TC 202/SC 4.)

ICS : Optical equipment (37.020)

This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.