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21/30433862 DC

BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films

General Information

Status : Definitive
Standard Type: Main
Document No: 21/30433862 DC
Document Year:
Pages: 22
  • Section Volume:
  • GBM38 Chemical Technology (GMB38)

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21/30433862 DC
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